Infrared spectrometer IconIR300™

AFMinspectionfor nanotechnology

Adds 300 mm of sample access for semiconductor R&D, failure analysis, and nanocontaminant identification The Dimension IconIR300™ large-sample nanoIR system provides high-speed, high-accuracy nanoscale characterization for semiconductor applications, featuring unrivaled capabilities, sample size, and material type flexibility. Through its combination of proprietary photothermal IR spectroscopy and nanoscale AFM property mapping capabilities, IconIR300 enables automated wafer inspection and defect identification on the widest range of wafer and photomask samples. The system significantly extends the application of AFM-IR technology to semiconductor industry segments beyond the reach of traditional techniques. Built on the groundbreaking large-sample architecture of the Dimension IconIR system, IconIR300 provides correlative microscopy and chemical imaging, as well as enhanced resolution and sensitivity. Integrated with automated wafer handling and advanced data collection/analysis software, the system enables greater time- and cost-savings and production efficiency. Whole-Wafer nanoscale chemical and material property characterization Combines IR spectroscopy and AFM property mapping for highly accurate, non-destructive measurements of 200 mm and 300 mm wafers. Unambiguous identification of organic/inorganic nano-contaminants Improves semiconductor wafer and photomask quality with photothermal AFM-IR data that directly correlates to FTIR libraries. Automated recipe-based measurements Deliver user-friendly access to comprehensive data and KLARF file support. Only the Dimension IconIR300 system provides: