The Yocto III plasma system is primarily used in the following applications: activation, cleaning
Basic equipment
Voltage supply: 230 V
Gas supply
Process gas via filter
Flow via valve (not adjustable)
Ventilation via filter
Vacuum chambers
Borosilicate glass (UHP) round with cover (approx. ∅ 50 mm, L 150 mm)
Electrodes
A pair of electrodes outside of the vacuum chamber
Controls
Generator for plasma generation
2-stage switch
Start button
Power switch
Generators
Frequencies: 100 kHz: power 0 - 30 W
Vacuum pump
Installed in the housing
Oil-free
Capacity: 0.75 m3/h