Production system PlasmaPro 100 Nano CVD

Chemical Vapour Deposition (CVD) & PECVD tools for growth of 1D/2D nanomaterials and heterostructures. PlasmaPro 100 Nano (formerly Nanofab) delivers high-performance growth of nanomaterials with in-situ catalyst activation and rigorous process control, with flexible temperatures up to 1,200°C. Excellent uniformity with flexible temperatures up to 1200°C Options of a 700°C, 800°C or 1200°C table Sample sizes up to 200mm Vacuum load lock - Quick sample exchange Cold wall design with showerhead based uniform precursor delivery Optional liquid/solid source delivery system for growth of MoS2,MoSe2 and other TMDCs Excellent uniformity with flexible temperatures up to 1200°C Options of a 700°C, 800°C or 1200°C table Sample sizes up to 200mm Vacuum load lock - Quick sample exchange Cold wall design with showerhead based uniform precursor delivery Optional liquid/solid source delivery system for growth of MoS2,MoSe2 and other TMDCs Global Customer Support Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system. Remote diagnostics software provides quick and easy fault diagnosis and resolution. Support contracts are available to suit the budget and situation. Global spares in strategic locations for quick response.