Production system Atomfab

Atomfab is the fastest remote plasma production ALD system on the market. SOLUTIONS FOR YOUR PRODUCTION NEEDS Competitive CoO Quick, easy maintenance Excellent film uniformity High material quality Low substrate damage Faster cycles times, high throughput Clusterable and automated wafer handling PERFORMANCE Atomfab's ALD technology offers precisely controlled ultra‑thin films for advanced applications on the nanometre scale, with conformal coating of sensitive substrates structures. PROCESS BENEFITS FOR PASSIVATION OF POWER & RF DEVICES Guaranteed processes setup by our engineers Lifetime process support for additional/new processes Low-damage plasma processing High quality deposition with low film contamination Low particle levels Short plasma exposure times enabling high throughput Plasma surface pre-treatments ADVANTAGES OF PLASMA ALD FOR GaN, POWER & RF DEVICES With plasma pre-treatment prior to deposition to enhance interface quality Low damage, uniform deposition Remote plasma ALD with controlled ion energy from near zero to 30 eV ALD passivation, gate dielectric by Al2O3 films. GLOBAL CUSTOMER SUPPORT Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system. Remote diagnostics software provides quick and easy fault diagnosis and resolution Support contracts are available to suit the budget and situation Global spares in strategic locations for quick response