The compact film thickness monitor is a reflection spectrophotometric film thickness meter that uses a small reflection probe and is applicable in all situations from the laboratory level to in-line 100% inspection in the production process. It has excellent maintainability and can be used for incorporation into process equipment and line management.
Simultaneous measurement of up to 9 types of transparent films is possible.
It can be used as an in-line or end-point monitor for the various multi-layered film process.
The compact probe can be installed in a small space inside the process tool. It is also possible to judge the mixture ratio of the mixed layer or the crystallinity of Poly-Silicon by using the EMA theory.
Compact probe with the optical fiber
can be installed in a small space inside the process tool.
Good repeatability of the film thickness measurement 0.1 nm(3a)
Multilayer film thickness measurement up to 9 layers
Material analysis function
• Evaluation of mixing ratio of the composite material using EMA
• Crystallinity and Analysisy of the optical constants
Wireless(Option)
Film thickness end point detection software is included
Automatic mapping stage(Option)
Recommended system requirements
Room temperature - : 18 to 45 ℃
Long term - : < ±2.0℃/24Hours
Short term - : < ±1.0℃/1Hour
Humidity - : 45±20% (Under no condensation)